|
Yoshihide Kihara is a director of advanced process development laboratory in Etch Systems Technology Development Center in R&D Division at Tokyo Electron Miyagi Limited since 2011 with responsibility dielectric etching process and plasma chamber development. Prior to joining Tokyo Electron Miyagi, he was researcher position for Hitachi Central Research Laboratory. At current position, he investigated the surface reaction with various etch chemistries as well as plasma physics. At this moment, he is leading development activities in the etch core technology such as atomic layer etching, combination of etch and atomic layer deposition and high aspect ratio etching as a technical leader.
|
