|
Masaru Izawa is a Senior Chief Engineer at Hitachi High-Tech Corporation. He joined Hitachi, Ltd. in 1989, where he held a management position in plasma etching technology within the Central Research Laboratory.
In 2012, he transferred to Hitachi High-Tech Corp, taking charge of R&D for plasma etching tools and leading various joint development projects.
He received his Ph.D. from Nagoya University in 2010. He has been recognized with several awards in the plasma processing field.
He is a distinguished speaker, having delivered numerous plenary and invited lectures in the domains of plasma processing and semiconductor technology.
|
