|
Xu Ma received the B.S. degree in electrical engineering from Tsinghua University, Beijing, China, and the Ph.D. degree in electrical and computer engineering from University of Delaware, Newark, DE, USA. He was a Postdoctoral Scholar in electrical engineering and computer sciences with the University of California, Berkeley. He is currently a Professor with the School of Optics and Photonics at Beijing Institute of Technology, Beijing, China. He is the Associate Director of the Key Laboratory of Photoelectronic Imaging Technology and Systems, Ministry of Education of China, and the Director of Section of Photoelectronic Imaging & Information Engineering. His research interests include computational imaging, computational lithography, and optoelectronic image processing. He is the first author of the book “Computational Lithography” (Wiley and Sons, 2010). He published more than 90 papers, and hold more than 30 patents. He is the Senior Member of OSA, IEEE and SPIE.
|
