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Gayle Murdoch graduated from the University of Edinburgh in 1997 with an Honours degree in Chemical Physics. She began her career at NEC Semiconductors (UK) as a lithography process engineer, and in 2000 moved to Filtronic Compound Semiconductors (later RFMD), eventually becoming lead etch engineer. In 2008 she joined imec’s advanced lithography team, and since 2013 she has held her current role of senior integration engineer in BEOL, where she is lead integrator for 28nm node platforms and is currently working on technologies to enable 5nm node and beyond.
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