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Chengbai Xu, a R&D director of Lithography, Semiconductor Technologies in DuPont Electronics and Imaging, Marlborough, MA. Chengbai has been working in the electronic material industry for more than 20 years. She leads global R&D organization to conduct research and product development, and successfully commercialized many leading-edge products including iline, 248nm and 193nm photoresists, anti-reflective coatings, top coats for 193nm immersion lithography, and chemical trim overcoats which shrink photoresist features beyond the lithography resolution. She is an inventor of 123 granted patents and published 40 technical papers in various journals. Chengbai received her Ph.D. from Technical Institute of Physics and Chemistry of Chinese Academy of Science in Beijing, China. She performed her postdoctoral research at the Chemical Engineering Department of Stanford University.
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