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Dr. Qi Xia is a Professor at Huazhong University of Science and Technology. He received his Ph.D. from Chinese University of Hong Kong in 2007. Recently, his research interest focuses on computational lithography including mask optimization based on parametric curve, source and mask optimization, imaging model of lithography. Previously, his research work was mainly about level set based topology optimization design method. He has published over 60 first- or corresponding-author papers and 27 patents.
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