| Date: | 13:30-15:00 on March 25, 2025 |
| Venue: | Shanghai International Convention Center |
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Topic: Photolithography and Related Technologies, Process Standards, and Future Outlook Speaker: Dr. Qiang Wu, Professor of the School of Microelectronics of Fudan University Abstract: This tutorial will provide the audience with an overall introduction to the photolithography process, related equipment, material, and process standards and future outlook. For the process and related equipment and material, I will present the following: a brief history of optical science and technology, the basic imaging theory, process window parameters and optimization, Source-Mask co-Optimization (SMO), exposure tools, photoresists, photomasks, computational lithography algorithms, the optical proximity correction (OPC), and the EUV lithography. Forthe part of the process standards, I will discusson the standards for linewdith uniformity, process window parameters, and resolution limit of EUV. Finally, an outlook will be provided from the author's perspective.Biography: Dr. Qiang Wu is a Professor at Fudan University. He graduated from Yale University with a Ph.D. degree in 1999. Then he worked for several companies as a photo engineers and managers. His research interests includes lithography process, equipment/material development, computational lithography, etc. He has published 83 papers and 112 patents. |