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Mr. Toru Fujimori is a Senior Engineer at Hitachi High-Tech Corporation, specializing in advanced resist metrology. He received B.S. and M.S. degrees in Organic Chemistry from Saitama University, Japan, in 1989 and 1991, respectively.
Prior to joining Hitachi High-Tech, he worked at FUJIFILM Corporation, where he was engaged in the development of imaging materials and photoresists for a broad range of lithographic technologies, including KrF, ArF, ArF immersion, electron-beam, and EUV lithography. He also contributed to the development of color resist materials for image sensors and served as a Senior Researcher at EIDEC from 2014 to 2016.
Mr. Fujimori is the inventor or co-inventor of more than 200 patents and has authored numerous technical papers and book chapters related to photoresists, lithography, and resist metrology.
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